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{{Refimprove|date=September 2022}}
'''Plasma processing''' is a [[Plasma (physics)|plasma]]-based material processing technology that aims at modifying the chemical and physical properties of a surface.<ref>{{cite book |last1=National Research Council |title=Plasma Processing of Materials: Scientific Opportunities and Technological Challenges |date=1991 |publisher=National Academies Press |___location=Washington, DC |isbn=978-0-309-04597-1 |url=https://doi.org/10.17226/1875}}</ref>▼
▲'''Plasma processing''' is a [[Plasma (physics)|plasma]]-based material processing technology that aims at modifying the chemical and physical properties of a surface.<ref>{{cite book |last1=National Research Council |title=Plasma Processing of Materials: Scientific Opportunities and Technological Challenges |date=1991 |publisher=National Academies Press |___location=Washington, DC |doi=10.17226/1875 |isbn=978-0-309-04597-1 |url=https://doi.org/10.17226/1875}}</ref>
Plasma processing techniques include:
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Related topics are [[plasma chemistry]], [[chemical vapor deposition]], and [[physical vapor deposition]] processes like [[sputter deposition]], plasma iondoping, [[vacuum plasmaspraying]], and [[reactive ion etching]].
{{DEFAULTSORT:Plasma Processing}}▼
[[Category:Plasma processing| ]]▼
==References==
{{reflist}}
▲{{DEFAULTSORT:Plasma Processing}}
▲[[Category:Plasma processing| ]]
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