Reflection high-energy electron diffraction: Difference between revisions

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===Vacuum requirements===

Because gas molecules diffract electrons and affect the quality of the electron gun, RHEED experiments are performed under vacuum. The RHEED system must operate at a pressure low enough to prevent significant scattering of the electron beams by gas molecules in the chamber. At electron energies of 10keV10 keV, a chamber pressure of 10⁻⁵ mbar or lower is necessary to prevent significant scattering of electrons by the background gas.<ref name="dobson1988"/> In practice, RHEED systems are operated under ultra high vacuums. The chamber pressure is minimized as much as possible in order to optimize the process. The vacuum conditions limit the types of materials and processes that can be monitored in situ with RHEED.

==RHEED patterns of real surfaces==

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*Introduction to RHEED, A.S. Arrot, Ultrathin Magnetic Structures I, ''Springer-Verlag'', 1994, pp.&nbsp;177–220

*A Review of the Geometrical Fundamentals of RHEED with Application to Silicon Surfaces, John E. Mahan, Kent M. Geib, G.Y. Robinson, and Robert G. Long, ''J.V.S.T.'', A 8, 1990, pp.&nbsp;3692–3700

{{Crystallography}}

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[[Category:Crystallography]]