Multiple patterning and Sebastián Piñera: Difference between pages

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[[Image:Sebastián Piñera.jpg|thumb|300px|Sebastián Piñera]]

Double patterning is a technique developed for [[photolithography]] to typically double the feature density. Double patterning may be used as early as [[65 nm]] node and will be the predominant lithography technique for [[32 nm]] node. It can in principle be extended to [[22 nanometer|22 nm]] node as well. Beyond 22 nm node will require more than double patterning; perhaps multiple patterning would become appropriate.

'''Miguel Juan Sebastián Piñera Echenique''' (born [[December 1]] [[1949]]) is a [[Chile]]an businessman and politician. He is a member of the center-right [[National Renewal (Chile)|National Renewal]] (RN) party, a constituent of the [[Alliance for Chile]] coalition. He ran for [[president of Chile]] in the [[Chilean presidential election, 2005|2005 election]], losing to [[Michelle Bachelet]] in the runoff election.

There are several types of double patterning. The three most common types are: double exposure, spacer mask, and intermediate pattern accumulation.

Sebastián is the third boy of a family of four brothers and two sisters: Guadalupe, [[José Piñera]] ( a former Minister of Labour under [[Augusto Pinochet]] and noted right-wing pension reformer), Pablo, Sebastián, Miguel (a Chilean singer and family rebel [[http://reportajes.canal13.cl/reportajes/html/Biografias/Reportajes/2004/179835.html]]) and Magdalena. Their parents were Magdalena Echenique Rozas and José Piñera Carvallo, an engineer who worked for [[CORFO]] and was Chile's ambassador to [[Belgium]] and to the [[United Nations]].

==Double Exposure==

==Personal life==

Double exposure is a sequence of two separate exposures of the same [[photoresist]] layer using two different [[photomask|photomasks]]. This technique is commonly used for patterns in the same layer which look very different or have incompatible densities or pitches. Unfortunately, the sum of the exposures cannot improve the minimum resolution limit. This technique allows manufacturability of minimum pitch features in a layout that may contain a variety of features. The [[65 nm]] node saw the introduction of alternating phase-shift masks (see [[photomask]]) in manufacturing. This technology is typically a double exposure approach.

Piñera was born in [[Santiago, Chile]] to Magdalena Echenique Rozas and José Piñera Carvallo, an engineer who worked for [[CORFO]] and was Chile's ambassador to [[Belgium]] and to the [[United Nations]]. He is the third man of a family of four brothers and two sisters: Guadalupe, [[José Piñera]] (a former Minister of Labour under [[Augusto Pinochet]] and noted pension reformer), Pablo, Sebastián, Miguel (a Chilean singer) and Magdalena.

Piñera is married to Cecilia Morel and has four children: Magdalena, Cecilia, Sebastián and Cristóbal.

==Spacer mask==

==Studies==

A spacer is a film layer grown on the sidewall of a pre-patterned feature. A spacer is formed by deposition of the film on the previous pattern, followed by etching to remove all the film material on the horizontal surfaces, leaving only the material on the sidewalls. By removing the original patterned feature, only the spacer is left. However, since there are two spacers for every line, the line density has now doubled. The spacer technique is applicable for defining narrow gates, for example.

Piñera has an undergraduate degree in Economics from Chile's [[Pontificia Universidad Católica de Chile|Catholic University]] as well as a [[Master's degree|Master's]] and [[Ph.D.]] in this subject from [[Harvard University]].

==Intermediate pattern accumulation==

==Businesses==

A "brute force" approach, intermediate pattern accumulation involves a sequence of (at least) two separate exposures and etchings of independent patterns into the same layer. For each exposure, a different photoresist coating is required. When the sequence is completed, the pattern is a composite of the previously etched subpatterns. By interleaving the subpatterns, the pattern density can theoretically be increased indefinitely, the half-pitch being inversely proportional to the number of subpatterns used. This composite pattern can then be transferred down into the final layer.

Piñera is the owner of [[Chilevisión]], a Chilean television channel; a major shareholder of [[LAN Chile|Lan Airlines]], and [[Colo-Colo]] a soccer team; and was a [[board director]] of several major Chilean companies. In an effort to quell criticism of a potential conflict of interests, he voluntarily left the board of many of the companies he owns in order to run for [[President of Chile]] despite this not being a requirement of Chilean law.

==Concerns==

According to ''[[Forbes]]'' magazine, Piñera is Chile's third richest businessmen (his fortune is estimated at US$1.2 billion). His wealth is attributed in great part due to his involvement in the introduction of [[credit card]]s to Chile in the late [[1970s]] and his subsequent investments.{{fact}}

With double patterning, the two main immediate concerns are reduced throughput and greater sensitivity to overlay error. The two concerns are an apparent tradeoff. Generally, lithography tool manufacturers (notably ASML, Canon and Nikon) have always maintained a trend of improvement in both areas, but double patterning elevates the priority.

==Political life==

It is often claimed that throughput is reduced by a factor of two by double patterning, but this is actually incorrect. Since a layer is split into two layers, the wafer effectively sees one extra layer of processing added to a sequence already containing many layers. Since double patterning is only applied to at most a few critical layers, the overall throughput of a wafer is affected by a small amount.

Piñera's involvement in politics began in the late [[1980s]] when he openly supported the "No" option against [[Augusto Pinochet]] in the [[1988]] plebiscite. After the return of democracy, Piñera headed the [[1989]] presidential campaign of [[Hernán Büchi]], a former finance minister of the Pinochet dictatorship. During the same election process, Piñera was elected as senator and soon after joined the center-right [[National Renewal (Chile)|National Renewal]] party.

A third concern is increased cost due to higher consumption of materials and tool time, as well as new hardware and processes associated with double patterning.

On [[May 14]] [[2005]] Piñera surprisingly announced his own candidacy for the [[Chilean presidential election, 2005|2005 presidential election]]. In the first round of the election, on [[December 11]], Piñera obtained 25.4% of the vote which placed him in second place. Since no candidate achieved an [[absolute majority]], a [[Two-round system|runoff election]] was held on [[January 15]] [[2006]] between Piñera and [[Michelle Bachelet]] of the governing coalition. Bachelet won the presidency with over 53% of the vote.

==External link==

*[[Image:Symbole-es.png|30px|Link to a Spanish language website]] [http://www.emol.com/especiales/_elecciones_2005/perfiles_pinera.htm Biographical notes, in Spanish]

[[Category:1949 births|Pinera, Sebastian]]

[[Category:Living people|Pinera, Sebastian]]

[[Category:Chilean people|Pinera, Sebastian]]

[[Category:Chilean politicians|Pinera, Sebastian]]

[[Category:Mass media owners|Pinera, Sebastian]]

[[Category:Billionaires|Pinera, Sebastian]]

[[Category:Harvard University alumni|Pinera, Sebastian]]

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