Open Artwork System Interchange Standard: Difference between revisions

Revision as of 19:30, 14 August 2022

Latest revision as of 07:24, 1 March 2025

(7 intermediate revisions by 7 users not shown)

Line 1:

{{POV|date=June 2015}}{{Infobox file format

{{Cleanup bare URLs|date=August 2022}}

{{POV|date=June 2015}}{{Infobox file format

| name = OASIS

| developer = [[SEMI]]

Line 10 ⟶ 9:

}}

'''Open Artwork System Interchange Standard''' ('''OASIS'''<ref>The trade name [http://tarr.uspto.gov/servlet/tarr?regser=serial&entry=78169188 OASIS is a registered trademark in the USA] of Thomas J. Grebinski, Alamo, California and licensed for use exclusively by [http://www.semi.org/ SEMI].</ref>) is a binary file format used byfor computersspecification of data structures for [[photomask]] production.<ref>{{Cite web |title=SEMI P39 : 2016 SPECIFICATION FOR OASIS - OPEN ARTWORK SYSTEM INT |url=https://infostore.saiglobal.com/en-us/Standards/SEMI-P39-2016-1036702_SAIG_SEMI_SEMI_2419502/ |access-date=2023-05-23 |website=infostore.saiglobal.com}}</ref> It's used to represent anda expresspattern an electronicinterchange patternand encapsulation format for anhierarchical integrated circuit mask layout information produced during its[[integrated circuit design]] andthat manufactureis further used for [[Semiconductor device fabrication|manufacturing]] of a [[photomask]]. The standard is developed by [[SEMI]].<ref name=":0">{{Citecite web |title=OASIS |url=https://www.layouteditor.org/layout/file-formats/oasis#:~:text=Open%20Artwork%20System%20Interchange%20Standard%20(OASIS)%20is%20a%20specification%20for,is%20the%20trademark%20of%20SEMI. |access-date=2022-05-26 |website=www.layouteditor.org}}</ref><ref name=":1">{{Citecite web |title=About OASIS SEMI P39 |url=http://www.yottadatasciences.com/compliancecenter.html |access-date=2022-05-26 |website=www.yottadatasciences.com}}</ref> The language defines the code required for geometric shapes such as rectangles, trapezoids, and polygons. It defines the type of properties each can have, how they can be organized into cells containing patterns made by these shapes and defines how each can be placed relative to each other. It is similar to [[GDSII]].

As of 2023 the cost of the standard for members of [[SEMI]] was set to $252 and non-members: US$335.<ref>{{Cite web |title=P03800 - SEMI P39 - Specification for OASIS® – Open Artwork System Interchange Standard |url=https://store-us.semi.org/products/p03800-semi-p39-specification-for-oasis%c2%ae-open-artwork-system-interchange-standard |access-date=2023-05-23 |website=semi.org |language=en}}</ref>

==Introduction==

Line 16 ⟶ 17:

OASIS is the purported commercial successor to the integrated circuit design and manufacturing electronic pattern layout language, [[GDSII]].

GDSII was created in the 1970s when integrated circuit designs had a few hundred thousand geometric shapes, properties and placements to manage. Today, there can be billions of shapes, properties, and placements to manage. File sizes of GDSII format often takes tens of gigabytes of storage and are difficult to store and process.<ref>{{Cite web |title=OASIS Format |url=http://www.wrcad.com/manual/xicmanual/node775.html |access-date=2023-05-23 |website=www.wrcad.com}}</ref> OASIS creators and users claimed that the growth of workstations' data storage and handling capabilities was far outpaced by the growth of Integrated Circuit layout complexity.<ref>{{cite web|url=http://www.eetimes.com/document.asp?doc_id=1276148 |title=Going from GDSII to OASIS |publisher=EETimes |date=2022-08-30 |accessdate=2022-09-11}}</ref> Therefore, OASIS tries to solve the purported problem of the large size of the [[GDSII]] files by introducing complicated types of the geometric shapes (25 types of trapezoids only) to reduce the data size. Also, variable-length numeric format (similar to [[Run-length encoding]]) for coordinates was implemented. Finally, each cell in the OASIS file can be independently compressed by the [[gzip]]-like algorithm.

The effort to create the OASIS format started in June 2001. The release of version 1.0 took place in March 2004. Its use required the development of new OASIS readers and writers that could be coupled to design and manufacturing equipment already equipped with GDSII readers and writers. Its adoption was born of a concerted effort by integrated circuit design, equipment, photomask, fabless, 3rd party Intellectual Property (IP) and manufacturing companies from the United States, Japan, Taiwan, Korea and Europe.

Line 99 ⟶ 100:

The fee-based specifications for SEMI P39 OASIS and SEMI P44 OASIS.MASK can be downloaded from SEMI's web-site.

== See also ==

* [[OpenAccess]]

Line 106 ⟶ 107:

* [https://store-us.semi.org/products/p03800-semi-p39-specification-for-oasis%C2%AE-open-artwork-system-interchange-standard?_pos=1&_sid=1c0bcca9d&_ss=r SEMI P39 OASIS Standard]

* [https://store-us.semi.org/products/p04400-semi-p44-specification-for-open-artwork-system-interchange-standard-oasis-%C2%AE-specific-to-mask-tools?_pos=2&_sid=1c0bcca9d&_ss=r SEMI P44 OASIS Standard]

* [https://web.archive.org/web/20191104140038/http://www.wrcad.com/oasis/oasis-3626-042303-draft.pdf Public OASIS draft (archived)]

==Footnotes==