Open Artwork System Interchange Standard: Difference between revisions

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{{Infobox file format

'''OASIS'''<ref>The trade name [http://tarr.uspto.gov/servlet/tarr?regser=serial&entry=78169188 OASIS is a registered trademark in the USA] of Thomas J. Grebinski, Alamo, California and licensed for use exclusively by [http://www.semi.org/ SEMI].</ref> (Open Artwork System Interchange Standard) is a language used by computers to represent and express an electronic pattern for an integrated circuit during its design and manufacture. The language defines the code required for geometric shapes such as polygons, rectangles and trapezoids. It defines the type of properties each can have, how they can be organized into cells containing patterns made by these shapes and defines how each can be placed relative to each other.

| name = OASIS

| developer = [[SEMI]]

| released = {{Start date and age|2002|9|br=yes}}{{r|:1}}

| standards = SEMI P39-0416{{r|:0}}

| free = No

| open = Yes

| url = [https://store-us.semi.org/products/p03800-semi-p39-specification-for-oasis%C2%AE-open-artwork-system-interchange-standard SEMI SEMI P39 - Specification for OASIS ] (P39-0416)

}}

'''Open Artwork System Interchange Standard''' ('''OASIS'''<ref>The trade name [http://tarr.uspto.gov/servlet/tarr?regser=serial&entry=78169188 OASIS is a registered trademark in the USA] of Thomas J. Grebinski, Alamo, California and licensed for use exclusively by [http://www.semi.org/ SEMI].</ref>) is a binary file format used for specification of data structures for [[photomask]] production.<ref>{{Cite web |title=SEMI P39 : 2016 SPECIFICATION FOR OASIS - OPEN ARTWORK SYSTEM INT |url=https://infostore.saiglobal.com/en-us/Standards/SEMI-P39-2016-1036702_SAIG_SEMI_SEMI_2419502/ |access-date=2023-05-23 |website=infostore.saiglobal.com}}</ref> It's used to represent a pattern an interchange and encapsulation format for hierarchical integrated circuit mask layout information produced during [[integrated circuit design]] that is further used for [[Semiconductor device fabrication|manufacturing]] of a [[photomask]]. The standard is developed by [[SEMI]].<ref name=":0">{{cite web |title=OASIS |url=https://www.layouteditor.org/layout/file-formats/oasis#:~:text=Open%20Artwork%20System%20Interchange%20Standard%20(OASIS)%20is%20a%20specification%20for,is%20the%20trademark%20of%20SEMI. |access-date=2022-05-26 |website=www.layouteditor.org}}</ref><ref name=":1">{{cite web |title=About OASIS SEMI P39 |url=http://www.yottadatasciences.com/compliancecenter.html |access-date=2022-05-26 |website=www.yottadatasciences.com}}</ref> The language defines the code required for geometric shapes such as rectangles, trapezoids, and polygons. It defines the type of properties each can have, how they can be organized into cells containing patterns made by these shapes and defines how each can be placed relative to each other. It is similar to [[GDSII]].

As of 2023 the cost of the standard for members of [[SEMI]] was set to $252 and non-members: US$335.<ref>{{Cite web |title=P03800 - SEMI P39 - Specification for OASIS® – Open Artwork System Interchange Standard |url=https://store-us.semi.org/products/p03800-semi-p39-specification-for-oasis%c2%ae-open-artwork-system-interchange-standard |access-date=2023-05-23 |website=semi.org |language=en}}</ref>

==Introduction==

{{More citations needed|date=May 2022}}

OASIS is the purported commercial successor to the integrated circuit design and manufacturing electronic pattern layout language, [[GDSII]].

GDSII had beenwas created in the 1970s when integrated circuit designs had a few hundred thousand geometric shapes, properties and placements to manage. Today, there can be billions of shapes, properties, and placements to manage. File sizes of GDSII format often takes tens of gigabytes of storage and are difficult to store and process.<ref>{{Cite web |title=OASIS addressedFormat the|url=http://www.wrcad.com/manual/xicmanual/node775.html constraints|access-date=2023-05-23 that|website=www.wrcad.com}}</ref> wereOASIS preventingcreators itsand effectiveusers useclaimed duringthat the designgrowth of workstations' data storage and manufacturehandling capabilities was far outpaced by the growth of today'sIntegrated leadingCircuit edgelayout integratedcomplexity.<ref>{{cite web|url=http://www.eetimes.com/document.asp?doc_id=1276148 |title=Going from GDSII to OASIS |publisher=EETimes |date=2022-08-30 |accessdate=2022-09-11}}</ref> Therefore, OASIS tries to solve the purported problem of the large size of the [[GDSII]] files by introducing complicated types of the geometric shapes (25 types of trapezoids only) to reduce the data size. Also, variable-length numeric format (similar to [[Run-length encoding]]) for coordinates was implemented. Finally, each cell in the OASIS file can be independently compressed by the [[gzip]]-like circuitsalgorithm.

The effort to create the competingOASIS format OASIS started in June 2001. The release of version 1.0 took place in March 2004. Its use required the development of new OASIS readers and writers that could be coupled to design and manufacturing equipment already equipped with GDSII readers and writers. Its industry wide adoption was born out of a concerted effort by integrated circuit design, equipment, photomask, fabless, 3rd party Intellectual Property (IP) and manufacturing companies from the United States, Japan, Taiwan, Korea and Europe. OASIS is now used for most leading edge integrated circuit designs.

A constrained version of OASIS, called [[OASIS.MASK]], addresses the unique needs of semiconductor photomask manufacturing equipment such as pattern generators and inspection systems. Both OASIS and OASIS.MASK are [[technical standard|industry standardsstandard]]s.

==Example Datafiledatafile==

{{overly detailed|section=yes|date=February 2012}}

[[File:Wikipediaoasisimage 2.png|thumb|This view is called a cell view. A cell can be a collection of placed geometric shapes. It also can be a collection of cells; each containing other cells and/or geometric shapes. Each cell must have at least one layer. In this view, each color represents a different layer within the cell. An integrated circuit can contain tens of thousands of unique cells and repeated instances of the same cell.]]

Line 28 ⟶ 41:

SWHXYRDL (Square,Width,Height,X-coordinate,Y-coordinate,Repetition,Datatype,Layer-number).

For this RECTANGLE record, the bit pattern is set to 0WHXY0DL (Not a square,Width,Height,X-coordinate,Y-coordinate,Not repetitive,Datatype,Layer-number). The first and second RECTANGLE records in cell "Cell_Placed_Shapes_2" (CELL refNum=1)" define repeated instances of a rectangle. The first RECTANGLE record (SW0XYRDL) uses a type 10 repetition (rep=rep10). The second RECTANGLE record (0WHXYR0L) uses a type 11 repetition (rep=Rep11). There are a total of twelveeleven repetition types (Rep0Rep1-Rep11). In the second RECTANGLE record bit pattern, the datatype(D) was set to '0' because the same datatype used in the first RECTANGLE record applies to the second RECTANGLE record. Other OASIS-supported geometric shapes having the record types POLYGON, TRAPEZOID, CTRAPEZOID, CIRCLE and PATH are defined by different bit patterns.

According to the CELLNAME records below, the bottom cells have the following ''cellname-strings'' "Cell_Placed_Shapes_1, . . . _2 and . . . _3". Each ''layer-number'' that had been assigned to a geometric shape has an association with a LAYERNAME record that defines a ''layer-interval'' and a ''layername-string''. In this view, the ''layername-string'', "Layer_Color_Mapping", defines the layer intervals used in a layer color table "layercolormap.data".

Line 80 ⟶ 93:

20 RECTANGLE 0WHXY000 width=120 height=825 x=875 y=325

20 RECTANGLE SW00YR00 width=340 y=1150 rep=rep10[dim=3 disp=(g(330,880) g(1265,990))]

13 CELL refNum=2

20 RECTANGLE 0WH0Y0DL layer=25 datatype=0 width=120 height=1650 y=2040

20 RECTANGLE 00HXY000 height=1375 x=1425 y=325

20 RECTANGLE 00HX0000 height=1155 x=1810

20 RECTANGLE 0WH0Y000 width=835 height=120 y=1480

20 RECTANGLE 0WH0Y000 width=120 height=2090 y=1600

20 RECTANGLE 00HXY000 height=770 x=2470 y=380

20 RECTANGLE 00H0Y000 height=870 y=2150

20 RECTANGLE 00HXY000 height=760 x=2855 y=1270

20 RECTANGLE 0WHXYR0L layer=49 width=3520 height=440 x=-220 y=0 rep=rep3[ydim=2 dy=3520]

20 RECTANGLE 0WHXYR00 width=220 height=495 x=110 y=1155 rep=rep10[dim=2 disp=(g(55,-715))]

20 RECTANGLE 0WH0Y000 width=880 height=220 y=1650

20 RECTANGLE 0WH0Y000 width=330 height=440 y=2090

20 RECTANGLE 0WH0Y000 width=715 height=275 y=2530

20 RECTANGLE 0WHXY000 width=220 height=440 x=165 y=3080

20 RECTANGLE S00XY000 x=605 y=2805

20 RECTANGLE 0W00Y000 width=2200 y=3025

20 RECTANGLE 0WHXY000 width=330 height=110 x=660 y=1870

20 RECTANGLE 0WHXY000 width=770 height=220 x=880 y=1210

20 RECTANGLE 0WHXY000 width=1045 height=275 x=1045 y=715

20 RECTANGLE 00H0Y000 height=220 y=2530

20 RECTANGLE 0WH0YR00 width=330 height=55 y=2750 rep=rep10[dim=2 disp=(g(1430,495))]

20 RECTANGLE 0WHXY000 width=440 height=220 x=1210 y=2090

20 RECTANGLE 0WHXY000 width=220 height=660 x=1430 y=1430

20 RECTANGLE 0WHXY000 width=990 height=55 x=1815 y=2970

20 RECTANGLE 0WHXY000 width=220 height=1540 x=1870 y=990

20 RECTANGLE 0WHXY000 width=605 height=220 x=2310 y=1540

20 RECTANGLE 0WHXYR00 width=220 height=880 x=2695 y=660 rep=rep3[ydim=2 dy=1100]

2 END

==Industry Standardstandard==

OASIS and OASIS.MASK are now formal [[technical standard|industry standardsstandard]]s. Both are owned and maintained by the trade and standards organization [[SEMI]]. SEMI serves the semiconductor materials and equipment industries worldwide.

The fee-based specifications for SEMI P39 OASIS and SEMI P44 OASIS.MASK can be downloaded from SEMI's web-site.

==External linksSee toalso Standards==

* [http://ams.semi.org/ebusiness/standards/SEMIStandardDetail.aspx?ProductID=1948&DownloadID=1108 SEMI P39 OASIS^TM Standard]

* [[OpenAccess]]

* [http://ams.semi.org/ebusiness/standards/SEMIStandardDetail.aspx?ProductID=211&DownloadID=1882 SEMI P44 OASIS^TM Standard]

==External links==

* [https://store-us.semi.org/products/p03800-semi-p39-specification-for-oasis%C2%AE-open-artwork-system-interchange-standard?_pos=1&_sid=1c0bcca9d&_ss=r SEMI P39 OASIS Standard]

* [https://store-us.semi.org/products/p04400-semi-p44-specification-for-open-artwork-system-interchange-standard-oasis-%C2%AE-specific-to-mask-tools?_pos=2&_sid=1c0bcca9d&_ss=r SEMI P44 OASIS Standard]

* [https://web.archive.org/web/20191104140038/http://www.wrcad.com/oasis/oasis-3626-042303-draft.pdf Public OASIS draft (archived)]

==Footnotes==