Open Artwork System Interchange Standard: Difference between revisions

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{{Infobox file format

{{POV|date=June 2015}}

| name = OASIS

'''OASIS'''<ref>The trade name [http://tarr.uspto.gov/servlet/tarr?regser=serial&entry=78169188 OASIS is a registered trademark in the USA] of Thomas J. Grebinski, Alamo, California and licensed for use exclusively by [http://www.semi.org/ SEMI].</ref> (Open Artwork System Interchange Standard) is a language used by computers to represent and express an electronic pattern for an integrated circuit during its design and manufacture. The language defines the code required for geometric shapes such as polygons, rectangles and trapezoids. It defines the type of properties each can have, how they can be organized into cells containing patterns made by these shapes and defines how each can be placed relative to each other.

| developer = [[SEMI]]

| released = {{Start date and age|2002|9|br=yes}}{{r|:1}}

| standards = SEMI P39-0416{{r|:0}}

| free = No

| open = Yes

| url = [https://store-us.semi.org/products/p03800-semi-p39-specification-for-oasis%C2%AE-open-artwork-system-interchange-standard SEMI SEMI P39 - Specification for OASIS ] (P39-0416)

}}

'''Open Artwork System Interchange Standard''' ('''OASIS'''<ref>The trade name [http://tarr.uspto.gov/servlet/tarr?regser=serial&entry=78169188 OASIS is a registered trademark in the USA] of Thomas J. Grebinski, Alamo, California and licensed for use exclusively by [http://www.semi.org/ SEMI].</ref>) is a binary file format used for specification of data structures for [[photomask]] production.<ref>{{Cite web |title=SEMI P39 : 2016 SPECIFICATION FOR OASIS - OPEN ARTWORK SYSTEM INT |url=https://infostore.saiglobal.com/en-us/Standards/SEMI-P39-2016-1036702_SAIG_SEMI_SEMI_2419502/ |access-date=2023-05-23 |website=infostore.saiglobal.com}}</ref> It's used to represent a pattern an interchange and encapsulation format for hierarchical integrated circuit mask layout information produced during [[integrated circuit design]] that is further used for [[Semiconductor device fabrication|manufacturing]] of a [[photomask]]. The standard is developed by [[SEMI]].<ref name=":0">{{cite web |title=OASIS |url=https://www.layouteditor.org/layout/file-formats/oasis#:~:text=Open%20Artwork%20System%20Interchange%20Standard%20(OASIS)%20is%20a%20specification%20for,is%20the%20trademark%20of%20SEMI. |access-date=2022-05-26 |website=www.layouteditor.org}}</ref><ref name=":1">{{cite web |title=About OASIS SEMI P39 |url=http://www.yottadatasciences.com/compliancecenter.html |access-date=2022-05-26 |website=www.yottadatasciences.com}}</ref> The language defines the code required for geometric shapes such as rectangles, trapezoids, and polygons. It defines the type of properties each can have, how they can be organized into cells containing patterns made by these shapes and defines how each can be placed relative to each other. It is similar to [[GDSII]].

As of 2023 the cost of the standard for members of [[SEMI]] was set to $252 and non-members: US$335.<ref>{{Cite web |title=P03800 - SEMI P39 - Specification for OASIS® – Open Artwork System Interchange Standard |url=https://store-us.semi.org/products/p03800-semi-p39-specification-for-oasis%c2%ae-open-artwork-system-interchange-standard |access-date=2023-05-23 |website=semi.org |language=en}}</ref>

==Introduction==

{{More citations needed|date=May 2022}}

OASIS is the purported commercial successor to the integrated circuit design and manufacturing electronic pattern layout language, [[GDSII]].

GDSII had beenwas created in the 1970s when integrated circuit designs had a few hundred thousand geometric shapes, properties and placements to manage. Today, there can be billions of shapes, properties, and placements to manage. File sizes of GDSII format often takes tens of gigabytes of storage and are difficult to store and process.<ref>{{Cite web |title=OASIS Format |url=http://www.wrcad.com/manual/xicmanual/node775.html |access-date=2023-05-23 |website=www.wrcad.com}}</ref> OASIS creators and users have claimed whatthat the growth of workstations' data storage and handling capabilities was far outpaced by the growth of Integrated Circuit layout complexity.<ref>{{cite web|url=http://www.eetimes.com/document.asp?doc_id=1276148 |title=Going from GDSII to OASIS |publisher=EETimes |date=2022-08-30 |accessdate=2022-09-11}}</ref> Therefore, OASIS tries to solve the purported problem of the large size of the [[GDSII]] files by introducing a complicated types of the geometric shapes (25 types of trapezoids only) to reduce the data size. Also, variable-length numeric format (similar to [[Run-length encoding]]) for coordinates was implemented. Finally, each cell in the OASIS file can be independently compressed by the [[gzip]]-like algorithm.

The effort to create the OASIS format has started in June 2001. The release of version 1.0 took place in March 2004. Its use required the development of new OASIS readers and writers that could be coupled to design and manufacturing equipment already equipped with GDSII readers and writers. Its adoption was born out of a concerted effort by integrated circuit design, equipment, photomask, fabless, 3rd party Intellectual Property (IP) and manufacturing companies from the United States, Japan, Taiwan, Korea and Europe.

A constrained version of OASIS, called [[OASIS.MASK]], addresses the unique needs of semiconductor photomask manufacturing equipment such as pattern generators and inspection systems. Both OASIS and OASIS.MASK are [[technical standard|industry standardsstandard]]s.

==Example Datafiledatafile==

{{overly detailed|section=yes|date=February 2012}}

[[File:Wikipediaoasisimage 2.png|thumb|This view is called a cell view. A cell can be a collection of placed geometric shapes. It also can be a collection of cells; each containing other cells and/or geometric shapes. Each cell must have at least one layer. In this view, each color represents a different layer within the cell. An integrated circuit can contain tens of thousands of unique cells and repeated instances of the same cell.]]

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==Industry Standardstandard==

OASIS and OASIS.MASK are now formal [[technical standard|industry standardsstandard]]s. Both are owned and maintained by the trade and standards organization [[SEMI]]. SEMI serves the semiconductor materials and equipment industries worldwide.

The fee-based specifications for SEMI P39 OASIS and SEMI P44 OASIS.MASK can be downloaded from SEMI's web-site.

==External linksSee toalso Standards==

* [http://ams.semi.org/ebusiness/standards/SEMIStandardDetail.aspx?ProductID=1948&DownloadID=1108 SEMI P39 OASIS^TM Standard]

* [[OpenAccess]]

* [http://ams.semi.org/ebusiness/standards/SEMIStandardDetail.aspx?ProductID=211&DownloadID=1882 SEMI P44 OASIS^TM Standard]

==External links==

* [https://store-us.semi.org/products/p03800-semi-p39-specification-for-oasis%C2%AE-open-artwork-system-interchange-standard?_pos=1&_sid=1c0bcca9d&_ss=r SEMI P39 OASIS Standard]

* [https://store-us.semi.org/products/p04400-semi-p44-specification-for-open-artwork-system-interchange-standard-oasis-%C2%AE-specific-to-mask-tools?_pos=2&_sid=1c0bcca9d&_ss=r SEMI P44 OASIS Standard]

* [https://web.archive.org/web/20191104140038/http://www.wrcad.com/oasis/oasis-3626-042303-draft.pdf Public OASIS draft (archived)]

==Footnotes==