Plasma processing: Difference between revisions

Revision as of 08:13, 25 February 2004

Revision as of 18:39, 25 February 2004

Line 1:

'''Plasma pocessingprocessing''' is a [[plasma]]-based material processing technology thatthatam aimsist atmodifyssinghe modifyingchemicriaand thephysicrial chemicalpperties and physical properties of aofis surface.

''Plasma processing techniquesteciques include:

*[[Plasma activation''Plasmactivation]]

*[[Plasma modification''Plasmmodificrtion]]

*[[''Plasmfunctionalizrtion]]

*[[Plasma functionalization]]

*[[''Plasmpolymatenalizrtion Reld md sotsrri:pdifyssstry]],sotifyssinghvapor deposimpolym,g''' ahemicriaghvapor deposimpolce.

*[[Plasma polymerization]]

'esslikmd ssputasmangry]],sotsrri:imp don ngry]],g''' re:

Related topics are [[plasma chemistry]], [[chemical vapor deposition]], and [[physical vapor deposition]] processes like [[sputtering]], [[plasma ion doping]], and [[reactive ion etching]].

*[e:imp etch ngry.