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The current injection technique was developed and published by Dr S. Eio of Staffordshire University (United Knigdom) in 2007.
The current injection technique was developed and researched to reduce the turn-OFF switching transient of power bipolar [[semiconductor]] devices. The Turn-OFF switching transient of [[Silicon]] based power bipolar semiconductor devices is known to limit the device switching speed and therefore limiting the efficiency of the application it is used within. This turn-OFF switching transient is due to the stored charge in the device during the forward conduction state.
Different techniques such as carrier lifetime control, injection efficiency and buffer layer devices have been used to
The current injection technique examined in Dr Eio's publications
Practical experimental results on
To prevent circuit commutation and bonding between the current injection circuit and the main test circuit where the Device under Test (DUT) is connected to, a non-invasive circuit was developed to magnetically couple the two circuits.
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7.N.Shammas, S.Eio, S.Nathan, K.Shukry, D.Chamund., “Thermal Aspects of Power Semiconductor Devices and Systems,” VII Conference Thermal Problems in Electronics, MicroTherm’07, 24th – 28th June 2007, Lodz, Poland
[[Category:Semiconductors| ]]
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