Open Artwork System Interchange Standard: Difference between revisions

Revision as of 14:00, 4 November 2019

Revision as of 16:11, 30 November 2019

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A constrained version of OASIS, called [[OASIS.MASK]], addresses the unique needs of semiconductor photomask manufacturing equipment such as pattern generators and inspection systems. Both OASIS and OASIS.MASK are [[technical standard|industry standard]]s.

==Example Datafiledatafile==

{{overly detailed|section=yes|date=February 2012}}

[[File:Wikipediaoasisimage 2.png|thumb|This view is called a cell view. A cell can be a collection of placed geometric shapes. It also can be a collection of cells; each containing other cells and/or geometric shapes. Each cell must have at least one layer. In this view, each color represents a different layer within the cell. An integrated circuit can contain tens of thousands of unique cells and repeated instances of the same cell.]]

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==Industry Standardstandard==

OASIS and OASIS.MASK are now formal [[technical standard|industry standard]]s. Both are owned and maintained by the trade and standards organization [[SEMI]]. SEMI serves the semiconductor materials and equipment industries worldwide.

The fee-based specifications for SEMI P39 OASIS and SEMI P44 OASIS.MASK can be downloaded from SEMI's web-site.

==External links to Standards==

* [https://store-us.semi.org/products/p03800-semi-p39-specification-for-oasis%C2%AE-open-artwork-system-interchange-standard?_pos=1&_sid=1c0bcca9d&_ss=r SEMI P39 OASIS^TM Standard]

* [https://store-us.semi.org/products/p04400-semi-p44-specification-for-open-artwork-system-interchange-standard-oasis-%C2%AE-specific-to-mask-tools?_pos=2&_sid=1c0bcca9d&_ss=r SEMI P44 OASIS^TM Standard]