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[[CMOS]] (complementary [[metal-oxide-semiconductor]]) technology opened the door to broad commercialization of gate arrays. The first CMOS gate arrays were developed by Robert Lipp<ref name=":1">{{Cite web|url=http://www.computerhistory.org/collections/catalog/102706880|title=Lipp, Bob oral history|website=[[Computer History Museum]]|access-date=2018-01-28}}</ref><ref>{{Cite web|url=http://www.computerhistory.org/siliconengine/people/|title=People|website=The Silicon Engine|publisher=Computer History Museum|access-date=2018-01-28}}</ref> in 1974 for International Microcircuits, Inc.<ref name=":0" /> (IMI) a Sunnyvale photo-mask shop started by Frank Deverse, Jim Tuttle and Charlie Allen, ex-IBM employees. This first product line employed [[10 µm process|7.5 micron]] single-level metal CMOS technology and ranged from 50 to 400 [[metal gate|gates]]. [[Computer-aided design]] (CAD) technology at the time was very rudimentary due to the low processing power available, so the design of these first products was only partially automated.
This product pioneered several features that went on to become standard on future designs. The most important were: the strict organization of [[NMOS logic|n-channel]] and [[PMOS logic|p-channel transistors]] in 2-3 row pairs across the chip; and running all interconnect on grids rather than minimum custom spacing, which had been the standard until then. This later innovation paved the way to full automation when coupled with the development of 2-layer CMOS arrays. Customizing these first parts was somewhat tedious and error prone due to the lack of good software tools.<ref name=":0" /> IMI tapped into PC board development techniques to minimize manual customization effort. Chips at the time were designed by hand drawing all components and interconnect on precision gridded Mylar sheets, using colored pencils to delineate each processing layer. [[Rubylith]] sheets were then cut and peeled to create a (typically) 200x to 400x scale representation of the process layer. This was then photo-reduced to make a 1x mask. Digitization rather than rubylith cutting was just coming in as the latest technology, but initially it only removed the rubylith stage; drawings were still manual and then "hand" digitized. PC boards meanwhile had moved from custom rubylith to PC tape for interconnects. IMI created to-scale photo-enlargements of the base layers. Using decals of logic gate connections and PC tape to interconnect these gates, custom circuits could be quickly laid out by hand for these relatively small circuits, and photo-reduced using existing technologies.
After a falling out with IMI, Robert Lipp went on to start California Devices, Inc. (CDI) in 1978 with two silent partners, Bernie Aronson and Brian Tighe. CDI quickly developed a product line competitive to IMI and shortly thereafter a 5 micron silicon gate single layer product line with densities up to 1,200 gates. A couple of years later CDI followed up with "channel-less" gate arrays that reduced the row blockages caused by a more complex silicon underlayer that pre-wired the individual transistor connections to locations needed for common logic functions, simplifying the first level metal interconnect. This increased chip densities 40%, significantly reducing manufacturing costs.<ref name=":1" />
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