Multiple patterning: Difference between revisions

Revision as of 14:39, 16 April 2024

Revision as of 14:42, 16 April 2024

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Self-aligned litho-etch-litho-etch (SALELE) is a hybrid SADP/LELE technique whose implementation has started in 7nm<ref>Q. Lin, Proc. SPIE 11327, 113270X (2020).</ref> and continued use in 5nm.<ref>[https://www.linkedin.com/pulse/salele-double-patterning-7nm-5nm-nodes-frederick-chen SALELE double patterning for 7nm and 5nm nodes]</ref>

===Multipatterning productivity improvements===

Since 2017, several publications have indicated ways to improve multipatterning productivity. Self-aligned blocking allows blocking or cutting patterns to cross adjacent lines.<ref>F. Lazzarino et al., Proc. SPIE 10149, 1014908 (2017)</ref> Cut redistribution allows distances between cuts to be adjusted to minimize the number of cut masks.<ref>Z. Xiao et al., Proc. SPIE 8880, 888017 (2013).</ref><ref>[Self-Aligned Block Redistribution and Expansion for Improving Multipatterning Productivity https://www.linkedin.com/pulse/self-aligned-block-redistribution-expansion-improving-frederick-chen-rgnwc/]</ref><ref>[ Self-Aligned Block Redistribution and Expansion for Improving Multipatterning Productivity ]</ref><ref>[https://medium.com/@chen.t.fred/self-aligned-block-redistribution-and-expansion-for-improving-multipatterning-productivity-ec5f615c9c01 Self-Aligned Block Redistribution and Expansion for Improving Multipatterning Productivity]</ref> These techniques may also be combined with self-aligned vias, described earlier.<ref>J-H. Franke et al., Proc. SPIE 10145, 1014529 (2017).</ref>

==Industrial adoption==