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DSA has not yet been implemented in manufacturing, due to defect concerns, where a feature does not appear as expected by the guided self-assembly.<ref>A. Gharbi et al., Proc. SPIE 9777, 97770T (2016).</ref>
At IWAPS 2024, Fudan University disclosed a quadruple-hole patterning technique based on DSA, which potentially significantly reduces the number of masks used in multipatterning.<ref>[https://www.linkedin.com/pulse/chinas-multipatterning-breakthrough-quadruple-hole-patterning-chen-9iskc/ China’s Multipatterning Breakthrough? Quadruple Hole Patterning by Directed Self-Assembly on a Staggered Via Grid]</ref><ref>Z. Wu et al., Proc. SPIE 13423, 134231O (2024).</ref>
==Other multi-patterning techniques==
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