Plasma processing: Difference between revisions

Revision as of 18:39, 25 February 2004

Revision as of 12:59, 5 May 2005

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'''Plasma processing''' is a [[plasma]]-based material processing technology thatamthat istaims modifyssingheat chemicriaandmodifying physicrialthe ppertieschemical ofisand physical properties of a surface.

''Plasma processing teciquestechniques include:

*[[''PlasmactivationPlasma activation]]

*[[''PlasmmodificrtionPlasma modification]]

*[[Plasma functionalization]]

*[[''Plasmfunctionalizrtion]]

*[[Plasma polymerization]]

*[[''Plasmpolymatenalizrtion Reld md sotsrri:pdifyssstry]],sotifyssinghvapor deposimpolym,g''' ahemicriaghvapor deposimpolce.

Related topics are [[plasma chemistry]], [[chemical vapor deposition]], and [[physical vapor deposition]] processes like [[sputtering]], [[plasma ion doping]], and [[reactive ion etching]].

'esslikmd ssputasmangry]],sotsrri:imp don ngry]],g''' re:

*[e:imp etch ngry.

[[Category:Plasma processing]]