Plasma processing: Difference between revisions

Revision as of 23:17, 10 August 2009

Revision as of 14:44, 17 December 2009

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{{Unreferenced|date=December 2009}}

'''Plasma processing''' is a [[Plasma (physics)|plasma]]-based material processing technology that aims at modifying the chemical and physical properties of a surface.

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Related topics are [[plasma chemistry]], [[chemical vapor deposition]], and [[physical vapor deposition]] processes like [[sputter deposition]], [[plasma ion doping]], [[vacuum plasmaspraying]], and [[reactive ion etching]].

{{DEFAULTSORT:Plasma Processing}}

[[Category:Plasma processing| ]]

[[Category:Articles lacking sources (Erik9bot)]]

[[ru:Плазменная обработка]]