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Line 9: <br /> OASIS ~~was~~is tothe ~~replace~~successor to anthe existing integrated circuit design and manufacturing computer language called [[GDSII\|GDSII]]. Line 19: A constrained version of OASIS, called [[OASIS.MASK\|OASIS.MASK]], addresses the unique needs of semiconductor photomask manufacturing equipment such as pattern generators and inspection systems. Both OASIS and OASIS.MASK are industry standards.<br /> ==Example OASIS Representation of a Cell Containing other Cells with Geometric Shapes==

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