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==Introduction==
OASIS is the purported commercial successor to the integrated circuit design and manufacturing electronic pattern layout language, [[GDSII]].
GDSII had been created in the 1970s when integrated circuit designs had a few hundred thousand geometric shapes, properties and placements to manage. Today, there can be billions of shapes, properties and placements to manage. OASIS addressedcreators and users have claimed what the constraintsgrowth thatof wereworkstations preventingdata itsstorage effectiveand usehandling duringcapabilities was far outpaced by the designgrowth andof manufactureIntegrated Circuit layout complexity. <ref>www.eetimes.com/document.asp?doc_id=1276148</ref> Therefore, OASIS tries to solve the purported problem of today'sthe leadinglarge edgesize of the [[GDSII]] files by introducing a complicated types of the geometric shapes (25 types of trapezoids only) to reduce the data size. Also, variable-length numeric format (similar to [[Run-length encoding]]) for coordinates was implemented. Finally, each cell in the OASIS file can be independently compressed by the integrated[[gzip]]-like circuitsalgorithm.
The effort to create the competingOASIS format OASIShas started in June 2001. The release of version 1.0 took place in March 2004. Its use required the development of new OASIS readers and writers that could be coupled to design and manufacturing equipment already equipped with GDSII readers and writers. Its industry wide adoption was born out of a concerted effort by integrated circuit design, equipment, photomask, fabless, 3rd party Intellectual Property (IP) and manufacturing companies from the United States, Japan, Taiwan, Korea and Europe. OASIS is now used for most leading edge integrated circuit designs.
A constrained version of OASIS, called [[OASIS.MASK]], addresses the unique needs of semiconductor photomask manufacturing equipment such as pattern generators and inspection systems. Both OASIS and OASIS.MASK are industry standards.
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