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Line 109: Each full period corresponds to formation of a single atomic layer thin film. The oscillation period is highly dependent on the material system, electron energy and incident angle, so researchers obtain empirical data to correlate the intensity oscillations and film coverage before using RHEED for monitoring film growth.<ref name="dobson1988"/> Video 1 depicts a metrology instrument recording the RHEED intensity oscillations and deposition rate for process control and analysis. [[File:KSA 400 RHEED Oscillations.webm\|thumbnail\|400px\|'''Video 1:''' RHEED Oscillations on kSA 400 analytical RHEED system]] ===RHEED-TRAXS===

Reflection high-energy electron diffraction: Difference between revisions